Semiconductor oxidation and its effects

Kuvaus

This dataset includes figures' data including supplementary information for the articles in question. These articles have been written from the results obtained in two projects: Academy of Finland and Business Finland where we studied oxidation of semiconductor surfaces, silicon and compound semiconductor ones. In particular, we attempted to modify oxidation effects by ultrahigh vacuum methods, and combine surface-science and electrical measurements in the material characterization. The data include mainly microscopic images, diffraction patterns, x-ray photoelectron spectra, and current-voltages curves.
Näytä enemmän

Julkaisuvuosi

2024

Aineiston tyyppi

Tekijät

Pekka Laukkanen - Tekijä, Julkaisija, Muu tekijä

Projekti

Muut tiedot

Tieteenalat

Fysiikka

Kieli

Saatavuus

Avoin

Lisenssi

Creative Commons Nimeä 4.0 Kansainvälinen (CC BY 4.0)

Avainsanat

oxidation, interface defect, semiconductor surfaces, ultrahigh vacuum

Asiasanat

Ajallinen kattavuus

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Liittyvät aineistot